THE CRUNCH
GlobalFoundries is re-entering the leading-edge node race with FDX Fusion, a new process built on fully-depleted silicon-on-insulator (FD-SOI) technology. The company claims the node delivers 7 nm-class characteristics in terms of size and twice the transistor density of its first-generation 22FDX node, which was classed at 22 nm.
FD-SOI differs from traditional CMOS by adding a fully insulating layer beneath the transistor channel, extending substrate isolation further than usual. GlobalFoundries says this enables specialised capabilities, including ultra-low-power in-memory computing, seamless integration of embedded non-volatile memory such as eMRAM, and highly efficient dense logic designs.
The move marks a notable reversal. In 2018, with node design costs climbing into the multi-billion-dollar range and yield difficulties widespread, GlobalFoundries indefinitely halted its 7 nm development, leaving TSMC and Samsung as the leading-edge contract manufacturers while it pursued solutions that did not chase smaller transistors.


